Fabrication of circular optical structures with a 20 nm minimum feature size using nanoimprint lithography
نویسندگان
چکیده
We demonstrated the fabrication of Fresnel zone plates with a 75 nm minimum feature size and circular gratings with a 20 nm minimum linewidth in polymethyl methacrylate using nanoimprint lithography, and in metals by means of a lift-off technique. Observation of sharp Moiré patterns indicated the high fidelity of nanoimprint lithography in pattern duplication. Our results showed that nanoimprint lithography is a promising technology for patterning integrated optics. © 2000 American Institute of Physics. @S0003-6951~00!03906-1#
منابع مشابه
Fabrication and Optical Characterization of Silicon Nanostructure Arrays by Laser Interference Lithography and Metal-Assisted Chemical Etching
In this paper metal-assisted chemical etching has been applied to pattern porous silicon regions and silicon nanohole arrays in submicron period simply by using positive photoresist as a mask layer. In order to define silicon nanostructures, Metal-assisted chemical etching (MaCE) was carried out with silver catalyst. Provided solution (or materiel) in combination with laser interference lithogr...
متن کاملFabrication of large area 100 nm pitch grating by spatial frequency doubling and nanoimprint lithography for subwavelength optical applications
In this article we report on the fabrication of 100 nm pitch gratings over a large area ~;10 cm! using a simple, low-cost, fast process. This method includes ~1! generation of the grating pattern using interferometric lithography and spatial frequency doubling and ~2! pattern replication using nanoimprint lithography. The form birefringence of a 100 nm pitch Si grating was studied using ellipso...
متن کاملFabrication of 60-nm transistors on 4-in. wafer using nanoimprint at all lithography levels
Nanoimprint lithography ~NIL! is a paradigm-shift method that has shown sub-10-nm resolution, high throughput, and low cost. To make NIL a next-generation lithography tool to replace conventional lithography, one must demonstrate the needed overlay accuracy in multilayer NIL, large-area uniformity, and low defect density. Here, we present the fabrication of 60-nm channel metal–oxide–semiconduct...
متن کاملResistless Fabrication of Nanoimprint Lithography (NIL) Stamps Using Nano-Stencil Lithography
In order to keep up with the advances in nano-fabrication, alternative, cost-efficient lithography techniques need to be implemented. Two of the most promising are nanoimprint lithography (NIL) and stencil lithography. We explore here the possibility of fabricating the stamp using stencil lithography, which has the potential for a cost reduction in some fabrication facilities. We show that the ...
متن کاملNanoscale silicon field effect transistors fabricated using imprint lithography
We report the fabrication and characterization of nanoscale silicon field effect transistors using nanoimprint lithography. With this lithographic technique and dry etching, we have patterned a variety of nanoscale transistor features in silicon, including 100 nm wire channels, 250-nm-diam quantum dots, and ring structures with 100 nm ring width, over a 232 cm lithography field with good unifor...
متن کامل